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In silicon at T = 300 K the thermal-equilibrium concentration of electron is n0 = 5 x 10^4 cc. The hole concentration is
A
4.5 x 1015 cc
B
4.5 x 1015 m3
C
0.3 x 10-6 cc
D
0.3 x 10-6 m3
Correct Answer:
4.5 x 1015 cc
ni x ni = no x po.
Pure Si at 300 K has equal electron (ni) and hole concentration (p) of 1.5 X 1016 m-3. Doping by indium increases p to 4.5 X 1022 m-3. What is n in the doped silicon?
A
4.5 X 109 m-3
B
4.5 X 1022 m-3
C
5 X 109 m-3
D
5 X 1022 m-3
Find the velocity of an electron when its kinetic energy is equal to one electron volt (in 105m/s). Given charge of an electron e = 1.6 x 10-19 and mass of an electron m = 9.1 x 10-31.
A
3.9
B
4.9
C
5.9
D
6.9
Silicon is doped with arsenic (concentration 10
20
atoms.m
-3
). At room temperature, the electron and hole mobilities in Si are 0.14 m
2
.v
-1
.s
-1
and 0.05 m
2
v
-1
.s
-1
respectively. The conductivity in (?m)
-1
, at room temperature for Si doped with As is
A
0.11
B
0.96
C
2.24
D
2.72
The thermal-equilibrium concentration of hole p0 in silicon at T = 300 K is 1015 cm3. The value of n0 is
A
3.8 x 108 cm3
B
4.4 x 104 cm3
C
2.6 x 104 cm3
D
4.3 x 108 cm3
The hole concentration in extrinsic materials is _________ electron concentration.
A
much greater than
B
lesser than
C
equal to
D
negligible difference with
For manufacturing of a certain amount of hole, maximum hole size was found to be 50.14 mm and minimum hole size was found to be 49.98. What will be the Tolerance in mm?
A
0.14
B
0.15
C
0.16
D
0.17
For manufacturing of a certain amount of hole, maximum hole size was found to be 50.14 mm and minimum hole size was found to be 49.98. Tolerance in mm will be
A
0.12
B
0.13
C
0.16
D
0.20
In a room-and-pillar stope, bench blasting is conducted using ANFO having density of 800 kg/m
3
. The specific gravity of rock is 2.5, hole diameter is 100 mm and spacing to burden ratio is 1.3. The charge length of each blast hole is 80% of the hole length. For a desired powder factor of 0.48 kg/tonne, the spacing and burden of the blast pattern in m respectively are
A
2.0, 2.6
B
2.3, 1.8
C
5.2, 4.0
D
1.3, 1.0
A plate with an elliptical hole in the centre, with semi-major axis (a) perpendicular to the direction of loading and semi-minor axis (b) along the direction of loading, is subjected to a pull P. The maximum stress induced at the edge of the hole is equal to (where $$\sigma $$ = Stress for a plate with no hole i.e. nominal stress)
A
$$\sigma \left( {1 + \frac{{\text{b}}}{{2{\text{a}}}}} \right)$$
B
$$\sigma \left( {1 + \frac{{2{\text{a}}}}{{\text{b}}}} \right)$$
C
$$\sigma \left( {1 + \frac{{\text{b}}}{{3{\text{a}}}}} \right)$$
D
$$\sigma \left( {1 + \frac{{3{\text{a}}}}{{\text{b}}}} \right)$$
S
1
: There were no finger prints anywhere.
P: First of all it was impossible even for a child to enter through the hole in the roof.
Q: When the investigators tried to reconstruct the crime, they came up against facts.
R: Moreover, when the detectives tried to push a silver vase, it was found to be double the sizeof the hole.
S: Again, the size of the hole was examined by the experts who said that nothing had been passed through it.
S
6
: These conclusions made the detectives think that it was a fake theft.
The Proper sequence should be:
A
PQRS
B
PSRQ
C
QPRS
D
SQPR